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Novel poly (sulfone-carbonate) polymers for rapid revelation of charged particle tracks by chemical etching process

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dc.contributor.author Naik, D.G.
dc.contributor.author Nadkarni, V.S.
dc.date.accessioned 2019-05-09T04:06:06Z
dc.date.available 2019-05-09T04:06:06Z
dc.date.issued 2019
dc.identifier.citation Radiation Physics and Chemistry. 160; 2019; 68-74. en_US
dc.identifier.uri https://doi.org/10.1016/j.radphyschem.2019.03.015
dc.identifier.uri http://irgu.unigoa.ac.in/drs/handle/unigoa/5630
dc.description.abstract This paper describes the synthesis and performance of two novel poly (sulfone-carbonate) polymeric detectorsfor rapid revelation of charged particletracks by chemical etching. Both the novel detectors were found to have alpha sensitivity higher than that of commercially used PADC (commercially available as CR-39 sup(TM)) detectors. A homopolymer Poly (2,2'-sulfonyl diethanol bis (allyl carbonate)) (PSDAC) from 2,2'-sulfonyldiethanol bis(allyl carbonate monomer (SDAC) and its copolymers with allyl diglycol carbonate (ADC) i.e. poly(SDAC-co-ADC) were successfully used as nuclear track detectors. The copolymer made from SDAC: ADC (4:6 w/w) shows maximum alpha sensitivity, almost double than that of PADC. Both these newly developed detectors can revel alpha tracks from sup(239)Pu source in 30 seconds and fission fragments from sup(252)Cf source in 10 seconds when chemically etched using 6 N NaOH at 70 degrees C, as compared to about 120 minutes and 45 minutes respectively, required for PADC at identical exposure and etching condition. Both the polymeric detectors can reveal charged particle tracks rapidly and effectively even by using 3 N NaOH at 60 degrees C etching condition. Here, we present our preliminary observations regarding the performance of the novel polymers containing sulfone-carbonate moieties and evaluation in comparison with the commercially available CR-39 polymeric track detector. en_US
dc.publisher Elsevier en_US
dc.subject Chemistry en_US
dc.title Novel poly (sulfone-carbonate) polymers for rapid revelation of charged particle tracks by chemical etching process en_US
dc.type Journal article en_US
dc.identifier.impf y


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