Abstract:
Tris(acetylacetonato)aluminium(III), [Al(C2H7O2)(3)], a precursor in vapor deposition of aluminum oxide, has been prepared starting from industrial alum, Al-2(SO4)(3).16H(2)O and characterized by chemical, IR, thermal (TG-DSC) and single crystal X-ray diffraction analyses. The compound crystallizes in the monoclinic space group P2(1)/c and all atoms are located in general positions. The central metal is hexacoordinated to three bidentate acetyl acetonate ligands.